
Description
The Vacuum Sintering Furnace is engineered for high-performance processing of ceramic materials, including silicon carbide (SiC), silicon nitride (Si₃N₄), and aluminum nitride (AlN). It supports multiple sintering techniques such as reaction sintering, low-pressure sintering, and recrystallization sintering. Suitable for both ceramic products and powder production, this furnace is available in horizontal and vertical structures to suit varied operational layouts. With precise temperature and atmosphere control, it ensures high-density, high-purity ceramic components with superior mechanical properties.
Technical Details
Description | |||
---|---|---|---|
Model | SMC-HTE-050511 | SMC-HTE-100612 | SMC-HTE-100813 |
Working Zone Size (W×H×L) (mm) | 500×500×1100 | 1000×600×1200 | 1000×800×1300 |
Max. Temperature (°C) | 1500/2400 | 1500/2400 | 1500/2400 |
Temperature Uniformity (°C) | ±5/±10 | ±5/±10 | ±5/±10 |
Ultimate Vacuum (Pa) | 1-100 | 1-100 | 1-100 |
Pressure Increase Rate (Pa/h) | 0.67 | 0.67 | 0.67 |